This glass reduces deterioration from laser radiation to 1/5 or less relative to that of conventional artificial crystals, and its light resistance against high-intensity lasers, which are used for IC steppers/scanners, etc., has been greatly improved. It is an optimal artificial crystal for polarization optical elements (such as depolarization plates and wave plates), diffractive optical elements, and prism materials.

Applications

  • Prisms
  • Synthetic quartz crystal CQ has considerably improved resistance to intense laser beams used in semiconductor lithography equipment, developed in synergy with Tokyo Denpa’shigh-quality quartz crystal manufacturing technology and AGC’s expertise in polishing and laser resistance evaluation.
    CQ shows deterioration by laser irradiation equal to or less than 1/5 that of conventional synthetic quartz crystal materials.

    Transmittance

    General Properties

    Grade CQ
    Bubbles and inclusions
    IEC758/JIS C 6704
    Ⅰb
    CTE  (30-100°C)
    Z axis
    8ppm/K
    X axis
    14ppm/K
    Refractive Index
    at 589nm
    1.54
    Laser durability Solarization
    none
    Degradation of Transmission
    /pls x 0.18Mpls
    <0.3%/cm
    Density
    g/c
    2.65
    Heat conductivity (200°C)
    K(W/m-℃)
    Z axis
    6.6
    K(W/m-℃)
    X axis
    4.1
  • Data is for reference only.
  • Durability to ArF Irradiation

    Conventional Synthetic Quartz Crystal vs. High Laser Durability Crystal CQ (5mJ/cm2/pulse)

    △absorption coefficient spectra after ArF irradiation (5mJ/cm2/pulse,1 Billion)

    Document download

    Product catalog